Sputtering Target

Product Description

Products:
Metal targets: Mg, Al, Si, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Y, Zr, Nb, Mo, Ru, Ag, In, Sn, Sb, Te, La, Hf, Ta, W, Re, Au, Gd, Tb, Dy, Yb, Ce, Nb, Sm
 
Metal alloy targets: NiFe, NiCr, NiV,  TiAl, CoCr, CoFe, CoTaZr, CuGa, CuInGa, CuInGaSn, ZnSn, CuZn, CuNi
 
Ceramic target: ITO, GZO, AZO, AlO3, NiO, MoOX, BiO2, Cr2O3, WO3, MgO, TiO2, ZrO2, HfO2, Nb2O5, Ta2O5
 
Specification:
Density: Hi-density
Purity:  *9.9%**9.***5%
Shapes: rings, circular, rectangular, cathode, Custom-made
Size: support any size
Application: flat panel display, glass coating, decoration coating, micro-electronics
Place of Origin: Changsha China (Mainland)
Packaging :Vacuum sealed package inside; Wooden case outside
Free Sample Availability: Yes
Delivery Lead Times: ****5 DAYS
Payment Terms: T/T, Western Union
Min Quantity: 1 PC
Quality Process Certifications: ISO ***1:***8