Wafer Drying Machine

Description

Equipment overview: 
Wafer drying machine has high cleanliness spin rinsedry function. Mainly used for silicon wafer, reticle, solar cells and other similar materials washing drying. 
Structure: 
Working cavity structure, the largest processing diameter**0mm. S is a double cassette structure 
system constitution: 
The machine adopts double station (or single) stack,product this type structure, each station can be run independently without mutual interference. Can realize automatic process  including rotary flushing, drying, nitrogen resistivity monitoring, anti-static control, cavity drying, fault display  alarm, system cleaning. 

The principle and characteristic of structure 
Cleaning technology 
High power brushless motor drive 
Cleaning work 
Rotating nitrogen sealing technology 
Deionized water control 
ESD control 
Earthquake, seismic isolation technology 
Speed, counting control technology 
Brake control technology 
System control technology 
Processing software 
Particle control performance 
Security and protection 
Door position monitoring and interlocking 
Production technology