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Sulfonate Copolymer Filtration Reducer for Drilling Fluids DSP-1
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Sulfonate Copolymer Filtration Reducer for Drilling Fluids DSP-1

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Contact Person Edward

Dongying, Shandong

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Product Description

Overview

    DSP*1 adopts the design of molecular structure,through the optimization of monomer of salt-  tolerance and temperaturetolerance. With N, N DMAA, AMPS, acrylic acid as monomer, it uses the water solution free radical 

polymerization, then cross linkingwith crosslinker. With a strong anionic and hydrophilic functional sulfonic 

acid of AMPS,DSP*1 has good salt resistance. The molecular chain of DSP*1 is carbon chain structure, it has high stability. Because the big volume of AMPSs repeat unit,  AMPS can 

effectively increase the steric hindrance,enhance the polymer molecular rigidity, so improved the copolymer

 molecular rigidity, and its temperature resistance, salt resistance and shearing resistance. DSP*1 overcome the disadvantages of poor shear performance,poor salt resistance, poor high valence ion sensitivity 

and heat stability of conventional polymer, is a new polymer filtrate reducer, and it can be applied in deep wells , 

super-deep wells and high-salinity brine, also can be used to  increase the viscosity and improve yield value of low solid, 

solid free completion fluid. The general amount 1%*2%. 

 

Technical Specification

Items

Indicators

Appearance

White or buff powder

Moisture, %

≤*2

Residue(0.*0mm),%

≤*0

pH

9~*1

API FL,mL

Room temperature

≤*0

**7℃/*6h

≤*8

Features

With high strength of the molecular chain, it has good shearing resistance;

It can improve mud cake quality and inhibit viscose soil being dispersed;

It has a heat stability and stands **0℃;

It has a strong capability of resisting calcium and magnesium. Its calcium resistance 

can be up to ****0ppm. And it can be applied in fresh water, seawater, and saturated 

salt water and Brine for completion drilling fluids; It can match with other agents well.

 

Country: China
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Edward < Shandong Deshunyuan Petro Sci >

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